CTECH GL IMPLANT 4.3MM
Double Helix Threading: The double-helix design sets C-TECH IMPLANTS apart from the single helix implants by giving them a more symmetrical introduction into the bone. This translates into masticatory load balance which drastically reduces stress. Its symmetry also renders the implant self-centering, eliminating any form of misalignment in terms of the main axis of the osteotomy site.
The pitch of the threads allows for an insertion time that is reduced by half.
Root Form Anatomical Design: The innovative macromorphological facility of the GL Implant System, with a variable degree tapering, more pronounced near the apical region, has been designed to make easier the implant's insertion and to achieve a high primary stability even in cases in which the bone is being undermined, ensuring thereby the full integrity of all proximal structures.
Micro-Threading: The micro threads increase functional surfaces, adapting them to the compact cortical bone tissue and safeguard it against aggression from larger threads to be found in conventional implants. Its delicate touch, as such, further reduces bone loss. Additionally, the micro threads allow the implant depth level to be adjusted.
Internal Hexagon Connection Surface Passivated: The implant surface is blasted with aluminum oxide and then subjected to progressive etching using critic acid. This surface treatment accelerates the osseointegration process by providing a greater and more uniform area of contact between bone and implant while favouring an immediate implant load. The treatment provides for a uniform surface with progressive trabeculation to be achieved. An additional advantage of the citric acid treatment is that it leaves no traces following decontamination, further reducing the risk of implant failure.
Intuitive and Easy To Use Kit: An instrumentation kit which has been kept as simple and efficient as possible. Predictable and easy to follow instrument protocols for practitioners of all levels.